Semiconductor Engineering sat down to discuss lithography and photomask technologies with Greg McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and ...

ACS Nano – Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist paper from June, 2010 is an example of some of the work on ...

There are no certainties anymore in lithography, but directed self-assembly does present some significant advantages that will carry through for at least several nodes. Directed self-assembly (DSA) ...

At next week’s SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line ...

A new paper claims that directed self-assembly could be key to patterning lines below 10nm, but line-edge roughness and manufacturing challenges still present substantial barriers. Share on Facebook ...

GRENOBLE, FRANCE: CEA-Leti said that its multi-partner programs, Ideal and Imagine, have demonstrated cost-effective solutions that extend 193nm immersion lithography for 1X nodes for critical levels ...

(Nanowerk News) Last week’s SPIE Advanced Lithography was a success in both quality of papers and numbers of attendees , with attendance at 2,230 and important progress reports on extreme ultraviolet ...

ALBANY, N.Y. & KYOTO, Japan--(BUSINESS WIRE)--Dainippon Screen Mfg. has confirmed our subsidiary company’s SOKUDO DUO 450mm coat/develop track system has been chosen by the Global 450mm Consortium ...

(Nanowerk News) As reported at the 2011 International Extreme Ultraviolet Lithography (EUVL) and Lithography Extensions (LE) Symposia, Oct. 17-21 in Miami, FL, SEMATECH engineers and the industry at ...

GRENOBLE, France--(BUSINESS WIRE)--CEA-Leti said today that its multi-partner programs, IDEAL and IMAGINE, have demonstrated cost-effective solutions that extend 193nm immersion lithography for 1X ...