SANTA CLARA, Calif. – During the SPIE Microlithography conference here, IBM Corp. and Nikon Corp. announced demonstration of a “real” wafer exposure tool, based on electron-beam projection lithography ...
Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...
Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...
TOKYO — Five more companies have joined the Leepl Consortium, which is developing and promoting the Low Energy E-beam Proximity Projection Lithography (Leepl) system, scheduled to hit the market early ...
In addition, it is the only production lithography tool capable of sub 50 nm geometries on 200 mm wafers. Uniquely configured with multiple miniaturized electron beam columns, the MB platform elevates ...
TOKYO--(BUSINESS WIRE)--Advantest Corporation (TSE: 6857, NYSE: ATE) May 19, 2015 - Leading semiconductor equipment supplier Advantest Corporation announces that imec has selected its leading-edge ...
Traditional lithography remains a standard in the industry, providing precision and a relatively cost-effective way to create patterns on the wafer when producing very high volumes of chips. However, ...
The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...
Jena, Germany -- Jenoptik invests in a new electron-beam (E-Beam) lithography tool, which will go into operation at its Dresden, Germany site in mid-2022. The new E-Beam system will be built by the ...
BLOOMINGTON, Minn. & SANTA CLARA, Calif.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT) announced today that it has received from Multibeam Corp., a first-of-a-kind Multicolumn E-Beam ...
E-beam lithography operates on principles similar to photolithography but provides significantly higher resolution. The process begins with coating a substrate with an electron-sensitive resist ...
The minimum time to expose a given area for a given dose is given by the following formula: Dose * exposed area = beam current * exposure time/ step size **2 = total charge of incident electrons For ...
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